Datasheet
ConfiguratorDruck UNIK5000F – High-Accuracy Pressure Sensor for Critical Oxygen Applications
The Druck UNIK5000F is a high-performance pressure sensor specifically developed for oxygen and oxygen-enriched applications where safety, measurement integrity, and long-term reliability are critical. Such environments require particular attention to material compatibility, cleanliness, and dependable pressure measurement.
Built on Druck’s proven UNIK5000 platform, the UNIK5000F combines advanced piezoresistive silicon sensing technology with a specialized design for oxygen service. Oxygen-compatible wetted materials and carefully selected Halocarbon fill fluid support reliable operation in demanding oxygen pressure measurement systems.
Typical applications include liquid oxygen storage, aerospace Ground Support Equipment (GSE), rocket propulsion testing, launch-pad utilities, and industrial oxygen generation and distribution facilities.
Specifically Designed for Oxygen Compatibility
Pressure measurement in oxygen systems presents particular requirements concerning material compatibility, fill fluids, and cleanliness of wetted components.
The UNIK5000F has been specifically engineered to address these requirements through several important design features:
- Oxygen-compatible wetted materials throughout the pressure system
- Halocarbon fill fluid specifically selected for oxygen service
- Cleanable wetted flow paths
- Design features intended to avoid particle traps and sharp corners
- Compatibility with customer-defined oxygen cleaning procedures
These characteristics support integration into oxygen systems where material selection and contamination control are essential considerations.
Oil-Free Calibration for Oxygen Applications
To support the cleanliness requirements of oxygen service, the UNIK5000F is calibrated exclusively using dry gas or deionized/pure water.
No oil is used during calibration, reducing the risk of contamination of the pressure system by oil-based calibration media.
The sensor is supplied in a cleanable condition and can be incorporated into customer-defined oxygen cleaning processes where required.
High-Accuracy Pressure Measurement up to 350 bar
The UNIK5000F offers pressure ranges up to 350 bar and is available in absolute and sealed gauge pressure configurations.
With measurement accuracy up to ±0.04% of full scale (FS), the sensor provides the precision required for demanding pressure measurement applications in aerospace, industrial gas processing, and advanced energy systems.
Its piezoresistive sensing technology delivers accurate and repeatable pressure measurements, supporting reliable process monitoring and testing.
Excellent Long-Term Stability
The UNIK5000F provides typical long-term stability of ±0.05% FS per year.
This high measurement stability supports dependable operation over extended service periods, making the sensor suitable for permanently installed pressure monitoring systems and demanding test applications.
Fast Dynamic Pressure Response
With a frequency response of up to 3.5 kHz, the UNIK5000F is suitable for applications requiring the measurement of rapid pressure changes.
The combination of high accuracy and fast dynamic response supports use in pressure testing, research and development, and dynamically loaded process systems.
Flexible Temperature Compensation
The UNIK5000F offers temperature compensation options covering temperatures from -40 to +80 °C.
Temperature compensation helps minimize temperature-related measurement deviations and maintain consistent pressure measurement performance within the specified compensated range.
Technical Specifications
| Parameter | Specification |
|---|---|
| Manufacturer | Druck |
| Model | UNIK5000F |
| Device type | High-accuracy pressure sensor for oxygen service |
| Sensor platform | Druck UNIK5000 |
| Sensing technology | Piezoresistive silicon pressure sensing |
| Pressure ranges | Up to 350 bar |
| Pressure types | Absolute and sealed gauge |
| Measurement accuracy | Up to ±0.04% FS |
| Long-term stability | Typically ±0.05% FS/year |
| Frequency response | Up to 3.5 kHz |
| Temperature compensation | Options covering -40 to +80 °C |
| Media compatibility | Specifically designed for oxygen applications |
| Wetted materials | Oxygen-compatible materials |
| Sensor fill fluid | Halocarbon fill fluid suitable for oxygen service |
| Wetted flow paths | Cleanable design intended to avoid particle traps and sharp corners |
| Calibration media | Dry gas or deionized/pure water |
| Oil during calibration | No oil used |
| Oxygen cleaning | Suitable for customer-defined oxygen cleaning procedures |
| Typical applications | Liquid oxygen systems, aerospace testing, Ground Support Equipment, oxygen generation |
Typical Applications
Liquid Oxygen Storage Systems
Precise pressure monitoring in liquid oxygen (LOX) storage and supply systems, subject to the specified media and temperature limitations of the selected installation.
Aerospace Applications
High-accuracy pressure measurement in oxygen-related aerospace systems requiring reliable performance, measurement integrity, and material compatibility.
Rocket Propulsion Testing
Pressure monitoring in oxygen supply and test systems used for rocket propulsion development, testing, and evaluation.
Ground Support Equipment (GSE)
Integration into ground-based oxygen supply, testing, and support equipment for aerospace applications.
Launch-Pad Utilities
Reliable pressure measurement in oxygen supply systems and associated infrastructure at launch facilities.
Industrial Oxygen Generation
Pressure monitoring in oxygen generation, gas processing, and industrial oxygen distribution systems.
Summary
The Druck UNIK5000F combines high-accuracy piezoresistive pressure sensing with a specialized design for critical oxygen applications. Featuring oxygen-compatible wetted materials, suitable Halocarbon fill fluid, oil-free calibration, and measurement accuracy up to ±0.04% FS, it provides a high-performance solution for demanding pressure measurement applications in aerospace, industrial gas supply, and oxygen processing systems.
